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Published: Tue, 03/05/19

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Researchers propose vertically integrated GaN nanowire FETs and InGaN LEDs for future MicroLED displays
2019-03-03 01:17:49-05

Researchers from the Rochester Institute of Technology managed to vertically integrate nanowire gallium nitride (GaN) field-effect transistors (FETs) and indium gallium nitride (InGaN) LEDs. Such technology could be useful for future Micro-LED displays.

Vertically integrated GaN nanowire FETs and InGaN LEDs (Rochester Institute of Technology) The researchers say that this integration could provide to enable smaller structures and more cost-effective processes compared to alternative light emitting architectures - such as high-electron-mobility transistor (HEMT) combined with LEDs.


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